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A N_2 Plasma Light Source Generated in Hollow Cathode Discharge and Its Application in Lithographic Plate Making

A N_2 Plasma Light Source Generated in Hollow Cathode Discharge and Its Application in Lithographic Plate Making
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摘要 Computer to conventional plate (CTCP) technology is getting more and more attention in printing industries. In this paper we report a nitrogen plasma light source generated in hollow cathode discharge (HCD), Which is used for pre-sensitivity (PS) plate exposure. The N2 molecule emits abundant spectrum ranging from 350 nm to 460 nm. With the voltage of 580 V, current of 1.8 A and pressure of 70 Pa in the discharge an optical power density of 0.46 mW/cm2 is obtained. The optical power density could be further increased with optimizing the lens system. The phototonus efficiency of this source is discussed in detail based upon the chemical principle and the FTIR analysis on the coating material. Computer to conventional plate (CTCP) technology is getting more and more attention in printing industries. In this paper we report a nitrogen plasma light source generated in hollow cathode discharge (HCD), Which is used for pre-sensitivity (PS) plate exposure. The N2 molecule emits abundant spectrum ranging from 350 nm to 460 nm. With the voltage of 580 V, current of 1.8 A and pressure of 70 Pa in the discharge an optical power density of 0.46 mW/cm2 is obtained. The optical power density could be further increased with optimizing the lens system. The phototonus efficiency of this source is discussed in detail based upon the chemical principle and the FTIR analysis on the coating material.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2007年第6期736-739,共4页 等离子体科学和技术(英文版)
基金 the scientific research common program of Beijing municipal commission(No.KM200710015002) the Beijing elitist funds (No.20051D0500403)
关键词 CTCP hollow cathode discharge optical density CTCP, hollow cathode discharge, optical density
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