电压施加方式在阳极氧化钛薄膜形成过程中的作用

Effect of pattern of applied voltage on formation of anodic TiO_2 porous films

采用阳极氧化的方法,通过改变电压的施加方式制备了具有不同形貌的氧化钛薄膜。使用扫描电子显微镜考察了氧化钛薄膜的形貌,结合实验现象探讨了阳极氧化钛薄膜纳米孔的形成机制。研究结果表明,采用一步施加电压和连续施加电压的方法,氧化钛薄膜纳米孔的形成过程由电压、阻挡层的厚度决定;采用两步施加电压的方法,氧化钛薄膜纳米孔的形成过程由放电电压、阻挡层的厚度和阻挡层/电解液的边界条件协同控制。在相同工艺条件下,采用两步施加电压法能够扩展阳极氧化钛薄膜纳米孔孔径和孔密度的范围。

TiO2 porous films were prepared by anodization with different patterns of applied voltage.The formation mechanism of TiO2 porous films was discussed through experiment phenomena and SEM observation.The results showed that the formation of TiO2 porous films by anodization was controlled by voltage,barrier thickness when one-step voltage method or continuous voltage method was applied.However,the formation was controlled by voltage,barrier thickness,and interface state of electrolyte/barrier when two-step voltage method was used.The range of nano-pore diameter and nano-pore density of the TiO2 film could be extended with two-step voltage method in the same process condition.