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大气压介质阻挡辉光放电中放电电流的测量与分析 被引量:1

Measurement and Analysis of Discharge Current in Dielectric Barrier Glow Discharge at Atmospheric Pressure
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摘要 介质阻挡放电产生的低温等离子体具有广泛的应用前景而成为研究热点。文章利用平行平板介质阻挡放电装置,在流动的氦气中实现了大气压均匀辉光放电,得到了大气压下的均匀等离子体。利用电学方法将放电电流从总电流中分离出来,从而得到了辉光放电的放电电流。通过分析放电电流、外加电压、气隙上电压以及壁电荷电量之间的相互关系,可以研究气体放电过程中壁电荷积累的微观动力学行为。实验结果表明壁电荷主要是在放电电流脉冲持续期间积累的,但电流脉冲结束后,由于气隙电压没有改变极性,壁电荷还会逐渐积累,气隙电压改变极性后,壁电荷量随时间减小。这些结果对壁电荷在介质阻挡辉光放电中作用的深入研究和大气压介质阻挡辉光放电的工业应用具有重要意义。 Dielectric barrier discharge has become a hot issue in low temperature plasma research field because of wide prospect for its application in industry. In the present paper, an uniform glow discharge was realized in atmospheric pressure helium with a parallel planar dielectric barrier discharge device and an uniform plasma was generated in helium at atmospheric pressure. Electrical method was used to separate the discharge current from the total current signal and the waveform of discharge current could be obtained. The relations among the discharge current, applied voltage, gap voltage and wall charge during the uniform glow discharge were used to analyze the dynamical behavior of wall charges during their accumulation. The results show that the wall charges were mainly accumulated during the existence of discharge current pulse, while the quantity of wall charges continued to increase until the gap voltage changed its polarity after the disappearance of discharge current pulse, and finally the quantity of wall charges decreased until the next breakdown. These experimental results are important for the further study of wall charges' effect in the dielectric barrier glow discharge and its application in industry.
出处 《光谱学与光谱分析》 SCIE EI CAS CSCD 北大核心 2007年第12期2403-2405,共3页 Spectroscopy and Spectral Analysis
基金 国家自然科学基金项目(10647123) 河北省教育厅项目(2006106) 河北大学自然科学基金项目(2006061)资助
关键词 介质阻挡放电 大气压辉光放电 壁电荷 Dielectric barrier discharge Atmospheric pressure glow discharge Wall charges
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  • 1李宝贵,熊昌友,李成贵,张庆荣.超光滑表面加工方法[J].制造技术与机床,2006(6):60-62. 被引量:4
  • 2Alagumurthi N, Palaniradja K, Soundararajan V. International Journal of Precision Engineering and Manufacturing, 2007, 8(3): 24.
  • 3Carr J W. Engineering Research Development and Technology, 1999, 3: 1.
  • 4Mori Y, Yamauchi K, Yamamura K, et al. Review of Scientific Instruments, 2000, 71(12): 4627.
  • 5Mori Y, Yamamura K, Endo K. Journal of Crystal Growth, 2005, 275: 39.
  • 6Yamamura K, Kato K, Sano Y, et al. Japanese Journal of Applied Physics, 2006, 45(10): 8281.
  • 7Zhang J F, Wang B, Dong S. Key Engineering Material, 2008, (364-366), 340.
  • 8Wang B, Zhao Q L, Wang L P, et al. Materials Science Forum, 2006, (532-533) : 504.
  • 9XIN Ren-xuan(辛仁轩).Plasma Emission Spectroscopy Analysis(等离子体发射光谱分析).Beijing:Chemical Industry Press(北京:化学工业出版社),2005.114.
  • 10SUN Han—wen(孙汉文).Atomic Spectroscopy Analysis(原子光谱分析).Bering:Higher Education Press(北京:高等教育出版社),2002.13.

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