退火工艺对ICF靶用冷轧镍膜的影响

Effect of annealing process on cold rolled Ni film for ICF target

为了满足惯性约束聚变(ICF)和状态方程(EOS)实验以及靶装配工艺的需要,在薄膜轧制过程中间以及轧制工艺完成以后需要对镍膜进行热处理来改善其组织结构和力学性能。对多辊轧机冷轧的方法制备的厚11μm镍膜中间退火工艺进行了研究,根据确定的合适的退火工艺退火后继续轧制得到成品镍膜厚7μm,表面粗糙度小于50 nm,基本满足目前状态方程实验对箔膜的要求。金相显微照片表明镍膜晶粒经500℃保温1 h退火由轧制前的条带状变为等轴晶;镍膜硬度经500℃退火后由4 GPa降低到了2.3 GPa左右;XRD衍射测试表明镍膜经500℃以上温度退火后,高角度的衍射峰开始出现,织构得到一定程度的改善。由此可以确定镍膜合适的中间退火温度为520℃保温1 h。

Films are usually annealed to ameliorate their structure and improve mechanical properties in need of inertial confinement fusion（ICF） and equation of state（EOS） experiment and procedure of target assembly. Ni films with surface root mean square roughness less than 50 nm, 7 μm thick were fabricated after process annealing at 450-700 ℃. The metallographs of Ni films show that the stripped grains have been changed in to equiaxed grains after annealing at 500℃ for 1 h. The hardness of Ni film has changed from 4 GPa to 2.3 GPa after annealing. The X-ray diffraction spectra of Ni firns show that diffraction peak at high angle appears after annealing at temperature higher than 500 ℃, which means the texture has been moderated to some extent, and the suitable temperature for Ni film annealing is 520 ℃.