等离子体刻蚀对Nafion~膜性能的影响

Effects of plasma etching on Nafion~ membrane performances

介绍了不同等离子体刻蚀条件对用于电解水制氢领域的Nafion117膜的性能影响。测试经表面刻蚀处理的Nafion膜的含水率、交换容量和电解性能,寻找最适用于Nafion膜表面刻蚀的条件。适宜的刻蚀有效地扩大了Nafion膜和催化电极之间的反应界面,并且使电极形成多孔结构,有利于产生的气体从电极上释放,降低槽电压。但过度刻蚀将破坏膜的离子簇,导致气阻增加,引起槽体性能下降。因此应严格控制射频功率和处理时间。

The article introduces the effects of different plasma etching conditions on Nation^R membranes performances which are used for water electrolysis. The suitable conditions for surface-roughening Nation^R membranes are investigated by testing water content,exchange content and cell performance for water electrolysis of surface-roughed membrane. Suitable etching will enlarge effectively the reaction interface between Nation^R membrane and the electrode and forming a porous structure of the electrode, which facilitated the release of evolving gas from the electrode, and reduce the cell voltage. However, excessive etching will destroy ions cluster of Nation^R membrane, result the increase of gas impedance, and the decrease of cell performances. Therefore the radio power and treatment time of etching machine should be controlled strictly.