微波等离子体化学气相沉积金刚石薄膜的进展

Development of Microwave Plasma Chemical Vapour Deposition for Diamond Growth

评述了用微波等离子体化学气相沉积法制备高质量人造金刚石薄膜的最新动态和发展趋势。介绍的内容包括:制备仪器、应用领域、沉积条件等。

The new progress of microwave plasma chemical vapour deposition (MP-CVD) for the growth of high quality diamond were discussed, the contents of the paper cover experimental equipment, applied situation, depositional conditions and developmental trends.