压强对磁控溅射沉积铌膜耐磨和耐蚀性的影响

Effect of Sputtering Gas Pressure on Wear Resistance and Corrosion Resistance of Niobium Films Prepared by Magnetron Sputtering Deposition

采用直流磁控溅射在钢基体上制备了铌薄膜,分别采用扫描电镜、原子力显微镜、X射线衍射仪、球盘式摩擦磨损实验机和电化学分析仪研究了不同溅射气压下铌膜表面形貌、相结构、耐磨性以及耐蚀性。结果表明:低压强下,晶粒细小,膜层平滑,晶粒择优取向为(110)晶面;压强升高使得晶粒粗大,粗糙度明显提高,择优取向转变为(211)晶面。较高的和较低的溅射压强对耐磨性和耐蚀性的提高较大,适中的压强对铌膜的性能提高反而较小,这可能是由于表面缺陷和组织结构的不同造成的。

Niobium films were deposited on the steel substrate using DC sputtering deposition. Influence of sputtering gas pressure on surface morphology, phase structure, wear resistance and corrosion resistance of niobium films has been investigated by scanning electron microscopy （SEM）, X-ray diffraction （XRD）, atomic force microscopy （AFM）, ball-on-disc tester and electrochemical tester respectively. Lower sputtering gas pressure results in the formation of fine-grained and smooth coating with （110） preferred crystal. Higher pressure gives rise to coarse grain, larger roughness and preferential crystal of （211）. Better wear resistance and corrosion resistance have been exhibited at the higher or the lower pressure. In contract moderate pressure may lead to worse surface properties. It may be due to the difference of defects on the surfaces and textures of niobium films.