多功能等离子体源离子注入工业样机的研制

STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS

等离子体源离子注入（ＰＳＩＩ）是一种新的离子注入技术。该技术与其它相关技术的结合又扩大了其应用。介绍国内首次研制成功的多功能ＰＳＩ工业样机的结构、性能、参数以及材料改性的初步结果。

Plasma Source Ion Implantation(PSII) is a new kind of ion implantation technique,and it can be used in a larger range when combinating with other related technologies.In this paper,the first multifunctional PSII apparatus suiting industrial applications is reported,including its structures,properties,parameters and the preliminary results of materials modification.