摘要
介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。针对典型的过滤式真空电弧镀膜装置，描述了其结构组成，分析了它的工作原理。分析结果表明，该技术与传统真空电弧离子镀膜技术相比，可有效地消除宏观颗粒对镀层的污染，可广泛应用于制作各种微电子膜透明导电薄膜（ＩＴＯ）以及类金刚石（ＤＬＣ）薄膜。
A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper .The typical experimental setup for this technique is deduced in detail,characteristics of arc plasma ions and macroparticles in Aksenov filter are analyzed theoretically.Laesly。some examples about applications and overview of this new technique are discussed.
出处
《真空与低温》
1997年第2期108-111,共4页
Vacuum and Cryogenics
