抛光砖打蜡机抛磨运动分析

ANALYSIS ON GRINDING MOVEMENTS OF A WAXING MACHINE FOR CERAMIC PLISHED TILES

瓷质抛光砖打蜡后要获得非常光亮的表面以及优良的防污效果,就必须在打蜡过程中使抛光砖表面各点处的抛磨次数尽可能一致。但在实际的打蜡过程中,很容易产生抛磨不均匀现象。本文以一种新型抛光砖打蜡机的抛磨装置为研究对象,建立抛磨运动的数学模型,利用Matlab软件进行抛磨运动仿真,分析不同抛磨运动参数对抛磨均匀性特性的影响,对打蜡机运动参数的确定和打蜡质量的研究具有参考价值。

To obtain very shining surface and high quality anti-pollution effect after waxing the ceramic polished tiles, it is required that the grinding frequency of every point on the tile surface is very homogeneous. But in the practical waxing process, it＇s very easy to bring inhomogeneity to the grinding. Taking the grinding device in a new waxing machine for ceramic polished tiles as the research object, the mathematical model of the grinding movements is built up and the kinematic simulation is made using Matlab software. The influence of the kinimatic parameters on grinding homogeneity is analyzed, and it is helpful to the determination of the kinematic parameters and the research of waxing quality of waxing machines.