连续快速常压化学气相沉积法制备TiO_2自清洁镀膜玻璃

Fast Coating of TiO_2 on Glass by Chemical Vapor Deposition at Atmospheric Pressure

以四异丙醇钛(TTIP)为先驱体,采用常压化学气相沉积(APCVD)法模拟镀膜工艺过程,制备出了TiO2自清洁镀膜玻璃。通过扫描电镜(SEM)、X射线衍射(XRD)、紫外-可见透射光谱(UV-Vis)等手段对样品进行分析,并研究了基板温度和移动速率与薄膜性能之间的关系。结果表明,当基板温度升高至580℃时,能够形成平整致密的薄膜,薄膜的结晶度,光催化性能和亲水性能也达到最好;基板移动速度下降到1.5 m/min时,薄膜的结晶度,光催化性和亲水性也可得到改善。依据光催化性能和亲水性能测试,表明沉积TiO2薄膜的最佳条件为基板温度58O℃,基板速度1.5 m/min。

TiO2-based film was fast coated on glass by chemical vapor deposition（CVD） of Ti（ OC3H7 ）4 （TITP） at atmospheric pressure to experimentally simulate the self-cleaning glass production on industrial scale. The microstructures, photo-catalysis and hydrophilicity of the coating were characterized with X-ray diffraction（XRD）, scanning electron microscopy（SEM） and ultraviolet-visible（UV-Vis） transmission spectroscopy. The results show that the substrate temperature and moving speed significantly affect the properties of the coating. For example, at a temperature above 580℃ and a moving speed of 1.5 m/min, the fairly smooth and dense coating displays the most favorable property.