偏压对磁控溅射沉积铌膜表面性能的影响

Bias Voltage and Properties of Magnetron Sputtered Niobium Films

利用直流磁控溅射在钢基体上沉积了铌薄膜,分别采用扫描电镜、原子力显微镜、X射线衍射仪和电化学分析仪研究了不同偏压下铌膜表面形貌、相结构以及耐蚀性。实验结果表明:在低于300 V偏压下,偏压的变化并没有使得铌膜的晶体结构发生改变,但对铌膜的表面形貌影响很大。随着偏压的提高,Nb膜表面先变得平坦,晶粒细小致密,孔隙减少;偏压升到300 V时,晶粒粗大,膜层变得疏松。偏压的增大使得铌膜的显微硬度和结合力相应提高。150 V偏压下沉积得到的铌膜耐蚀性最为出色,这主要缘于其较低的孔隙率和高的膜基结合力。

Niobium films were grown by DC magnetron sputtering on CrNi3Mo steel substrates. Its microstructures and mechanical properties were characterized with X-ray diffraetion（XRD）, scanning electron micmscopy（SEM）, atomic force micrescopy（AFM） and conventional probes. The results show that the negative bias voltages significantly affect its surface morphology and its mechanical properties. For example, at a bias of 150 V, the compact film has the highest erosion-resistance.