电沉积法制取非晶态Ni-W合金镀层及镀层特性的研究

Study on Amorphous Ni - W Alloy Coating by Electro - Deposit and Its Property

研究了络合剂加入量、镀液PH值、温度和电流密度对电沉积Ni-W合金的影响,同时对非晶态合金镀层与基体的结合力、耐蚀性及热处理的影响也进行了探讨。结果表明,各因素对电沉积都有不同程度影响,其中氨基络合物加入量为0.74-1.11mol/l时合金镀层稳定;W含量大于44％时镀层为非晶态,有优异的耐蚀性,加热后硬度明显增大,呈现了高硬度和高耐蚀性能,对不同材质具有良好结合力。

Effects of addition level of complexing agent, PH - value of plating solution and current density on electro - deposit of Ni - W alloy were studied. The influence on binding force between the matrix and the coating of amorphous Ni - W alloy, corrosion resistance and heat treatment were also discussed, The test results show that each factor has different degree of influence on electro - deposit. When the addition level of ammine complexes is 0.74 - 1.11 mol/l, the alloy coating is stable, when the content of W is over 44% , the coating becones amorphous, which has good corrosion resistance, very high hardness after heat - treatment, and high bind strength with different materials.