摘要
本文利用正交实验,对电沉积氧化镍薄膜的制备技术进行了研究,找出了基底的最佳预处理条件和制备条件,并对薄膜的电色性能及结构特性进行了研究。
The fabrication technology of electrodeposit NiO films was studied. The experimetnal results shown that the electrochromic properties of NiO films were strongly dependent on the electrodeposit conditions. The optimum fabrication conditions were determined. The structural and electrochromic properties of NiO films were investigated. High guality NiO films with polycrystalline structure were fabricated by those conditions.
出处
《电子显微学报》
CAS
CSCD
1997年第4期451-452,共2页
Journal of Chinese Electron Microscopy Society