反应溅射状态跃变过程

State Transition of Reactive Sputtering

分析了金属溅射区与氧化物溅射区之间的跃变时的参数变化，说明膜中金属对反应气体的捕获效应和真空室氧分压对靶氧化物形成速率的影响导致了反应溅射状态跃变。

The changes of parameters in the state transitions in reactive sputtering were calculated based on a kinetics model.The total oxygen flux fed into chamber has little effect on the changes of parameters during state transition,which rely mainly on the oxide coverages at the time.The state transition of reactive sputtering was referred to both the gettering effect of metals on the film surfaces and the effects of oxygen partial pressure on the forming rates of oxide on the target surfaces.