摘要
分别从溅射法和蒸发法两个方面评述了近年来纳米多层膜制备工艺的最新进展,在此基础上介绍了脉冲激光沉积(PLD)工艺制备纳米超硬多层膜的新方法。对典型的超硬膜TiN、(Ti,Zr)N、(Ti,Al)N、TiN/SiO2、B1-SiC、TiN/SiN4进行了简单回顾,并对其硬度、残余应力、摩擦磨损和抗氧化性能等方面做了详细的比较。最后,简述了纳米超硬多层膜表征的一般手段,并展望了发展前景。
The current achievements in various physical vapor deposition （PVD）techniques of superhard nanomultilayer films are reviewed based on sputtering and cathodic arc methods, and their properties are compared in this paper. In order to obtain high quality thin films, and principle and characteristics of the pulsed laser deposition （PLD） technique are also reviewed. The mechanical properties such as high hardness, relatively low residual stress, superior oxidation resistance, high hot hardness, and low thermal conductivity of TiN, Ti（C, N） and （Ti, Zr）N, TiN/SiO2, B1-SiC,TiN/Si3 N4, （Ti, Al）N for various machining applications are discussed. The recent progress in the nanoscale characterisation techniques of multilayers and their development trends are outlined.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2008年第2期18-21,共4页
Materials Reports
基金
浙江省自然科学基金青年科技人才培养项目(R405031)资助课题
关键词
纳米超硬多层膜
脉冲激光沉积
制备
表征
superhard nano-multilayer films, pulsed laser deposition, preparation, properties characterisation
