摘要
应用纳米压痕法测量残余应力的2种理论模型对5种电沉积镍镀层中的残余应力在不同压痕深度处进行了测量,并与X射线衍射法的测量结果进行了比较。结果表明,压深位于薄膜/基底界面处的2种压痕法测量结果与X射线衍射法的测量结果相近,且Yun-Hee模型与其符合得更好。
Residual stresses in five kinds of nickel coatings are determined by instrumented nanoindentation according to two kinds of theory models. The measurement results are compared with those of XRD method. It is found that the results of depth at the interface of film/substrate systems are in good agreement with those of XRD method analytical results. Relative to Suresh model, Yun-Hee model lead the results to be more consistent with those shown in XRD measurement.
出处
《材料导报》
CSCD
北大核心
2008年第2期115-118,共4页
Materials Reports
基金
国家自然科学基金重点项目(50531060)
国家自然科学基金杰出青年基金(10525211)
新金属材料国家重点实验室开放课题资助项目
关键词
纳米压痕法
电沉积镍镀层
残余应力
X射线衍射法
instrumented nanoindentation, electrodeposited nickel coating, residual stress, X-ray diffraction