摘要
应用选择性渗透的2-巯基乙磺酸(MES)自组装单层膜和纳米金阵列双层修饰玻碳电极,用溶出伏安法测定了在大分子污染物存在下的痕量Cu(Ⅱ)。纳米金阵列的修饰显著提高了玻碳电极的分析性能,而自发吸附的选择性渗透单层膜则有效阻止了电极表面被共存的大分子污染。方法校正曲线的斜率为0.13±0.016μA/10-9,LOD为0.137×10-9,且具有较大的线性范围。用此方法测定冶金废水中Cu2+含量,结果与AAS接近,方法具有实际应用价值。
A double-layer modified glassy carbon electrode (GCE) was firstly used for the determination of trace Cu( Ⅱ ) in the presence of macromolecular interference by stripping voltammetry. The modification of nanoparticles array significantly improved the analytical properties. Simultaneously, the self-assembled mereaptoethanesulfonate (MES) monolayer eliminate the electrode surface fouling from macromolecule interferences despite of the type and concentration. The average slope of calibration curve is O. 13 ± 0.016 μA ppb^-1, and the LOD of Cu^2+ is 0. 137 ppb. The determination results of real metallurgy wastewater samples are well agreed with those by AAS, which indicate that this method is accurate and reliable.
出处
《分析试验室》
CAS
CSCD
北大核心
2008年第2期1-5,共5页
Chinese Journal of Analysis Laboratory
关键词
CU
伏安法
大分子污染物
化学修饰电极
Copper
Vohammetry
Macromolecular contaminants
Chemically modified electrodes