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氧化锌薄膜生长与ZnO基薄膜晶体管制备(英文) 被引量:2

ZnO Film Growth and the Fabrication of ZnO-Based Thin Film Transistors
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摘要 通过金属有机化学气相沉积(MOCVD)方法生长ZnO薄膜。XRD测试显示出(002)晶面的强衍射峰,表明生长的ZnO薄膜是主度的c轴取向。基于ZnO薄膜基础,我们制备了ZnO基薄膜晶体管。 The ZnO films were deposited on the substrate of glass by MOCVD. The X-ray diffraction patterns of samples show sharp diffraction peaks ZnO(0 0 2),indicating that the films were highly c-axis oriented. Based on the ZnO film,we fabricated ZnO thin film transistor(ZnO-TFT).
出处 《电子器件》 CAS 2008年第1期115-116,共2页 Chinese Journal of Electron Devices
基金 NCET(No.05-0326,NSFC (No.60576054,60576043,60576056) Jilin Univresity In-novation Foundation project of Chang chun science and technology plans with contract number of 2006303 projects of Ministry of Construction China and Department of Education of Jilin province
关键词 氧化锌 薄膜晶体管 MOCVD ZnO thin film Thin film transistor MOCVD
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