摘要
通过假定一定的等离子体温度、密度分布,数值求解了一维等离子体的连续性方程,获得了杂质氩电离态分布,其辐射功率随空间位置和时间而变化。结果显示:在杂质注入时间较短时,由于离子输运及各种损失机制,总杂质密度在空间分布尚未达到平衡,电离态离子主要分布在等离子体周边,完全电离离子所占份额很小;当时间达到0.25 s时,氩在等离子体中完全达到平衡状态,体积辐射功率趋于一个稳定的数值;辐射功率在空间的分布随时间变化较小,主要分布在等离子体周边及边界层一个狭小的辐射带内,说明氩引起的辐射主要由低电离态离子引起。
This paper solved the one- dimentional time -dependent continuity equation of argon in plasma numerically by using a finite differential method under the assumed distribution of electron density and temperature. The ionization state distribution and radiation power as function of coordinate changes with time are obtained. The calculation results show that the ionized ions are deposited mainly at plasma periphery and edge region when the gas puffing time is short enough. At time of 0.25s, the impurity reaches a ionization/recombination and transport equilibrium state. The radiated power is distributed in a very narrow zonal region inside the plasma boundary all the time, and the gas puffing time has little effect of this kind on distribution.
出处
《重庆工商大学学报(自然科学版)》
2008年第1期60-64,共5页
Journal of Chongqing Technology and Business University:Natural Science Edition
关键词
等离子体
氩
辐射特性
plasma
argon
radiation character