高纯铜溅射靶材的发展及现状

Development and Current Tendency of High Purity Copper Sputtering Targets

溅射靶材主要应用于电子及信息产业，如集成电路、信息存储、液晶显示屏、激光存储器、电子控制器件等，也应用于玻璃镀膜领域和耐磨材料、高温耐蚀、高档装饰用品等行业.由于集成电路、信息存储及平面显示器等产业规模越来越大，这些高技术产业对各种超高纯金属及合金溅射靶材的需求也愈来愈多。本文简要介绍了高纯铜溅射靶材目前的市场情况、现状、应用领域和未来高纯铜溅射靶材发展趋势；并对高纯铜溅射靶材的特性要求以及微观组织控制做了简单的阐述。

Sputtering Targets are mainly applied in electro and the information industries, such as VLSI, information storage, liquid crystal display monitor, laser memory, electronic control component ; Sputtering Targets can be apply to the glass coating do- main ; Also may be supposed to use in the anti - friction material, the high temperature resists corrosion, profession and so on upscale decoration thing,With the development of VLSI, information storage and flat panel display （FPD）, the demands of sputtering target materials with super high purity are increased greatly in IT industry. In this paper we were introduce the current market condition and development tendency of high purity copper Sputtering Target, and the character requests of the high purity copper Sputtering Target, like the purity, the crystal grain size, and the crystal grain orientation have been elaborated, simultaneity discussed the microscopic organizafion to the. sputtering thin film nature shade as also in the target material the inclusion, the crystal grain size, the crystal grain orientation control method.