摘要
采用等离子体增强金属有机化合物化学气相沉积(PEMOCVD)工艺,在氧化性气氛(O2)和非氧化性气氛(H2、Ar)中制备了含铁聚合物杂混薄膜。探讨了工作气氛和偏压对膜密度、沉积速率及其分布的影响。
Different working gases(H 2, Ar and O 2) are used for preparation of Fe containing polymer composite films by plasma enhanced metal organic chemistry vapour deposition(PEMOCVD). The effect of working gas and bias on density, deposition rate and its distribution of films were discussed.
出处
《合成化学》
CAS
CSCD
1997年第1期11-13,共3页
Chinese Journal of Synthetic Chemistry
基金
国家自然科学基金
关键词
工作气氛
含铁聚合物
杂混薄膜
PEMOCVD
Working gas, Bias, Density of films, Deposition rate, Fe containing polymer composite films.