草酸中多孔阳极氧化铝膜生长动力学和形态结构研究(英文)

Growth kinetics and morphological structure of porous anodic aluminum oxide films formed in oxalic acid

为分析多孔阳极氧化铝膜形态参数和氧化条件的关系,在恒流条件下对0.3 mol.L-1草酸电解中形成多孔膜的生长动力学进行了研究.采用扫描电子显微镜和氧化膜质量测定方法检验了电流密度、温度和氧化时间对氧化膜生长动力学和氧化膜形态的影响.通过电压-时间曲线研究了氧化膜的电化学特征,并采用一元线性回归模型预测了氧化膜的生长速率.实验结果表明氧化膜的生长速率随电流密度的升高而升高,随温度的升高而下降.氧化膜质量的增长速率也随着电流密度的升高而增大.

The growth kinetics of porous anodic aluminum oxide films formed in 0.3 mol · L^-1 oxalic acid under galvanostatic conditions were studied to analyze the relationship between the anodizing conditions and the film morphology parameters. The effects of anodizing conditions （i. e. current density, temperature and anodizing time） on the film growth kinetics and morphology were examined by scanning electron microscopy and oxide film mass measurements. The electrochemical signatures were investigated by the voltage-time transients, and the growth rate of the anodic oxide films was predicted by the simple linear regression analysis. Experimental results indicate that the film growth rate increases with the increase of current density and the decrease of the temperature. The rate of increase of the film mass increases with an increase of current density.