期刊文献+
任意字段
题名或关键词
题名
关键词
文摘
作者
第一作者
机构
刊名
分类号
参考文献
作者简介
基金资助
栏目信息

Properties of ITO:Zr films deposited by co-sputtering 被引量：1

Properties of ITO:Zr films deposited by co-sputtering
下载PDF
导出
摘要 ITO:Zr films were deposited on glass substrate by co-sputtering with an ITO target and a Zirconium target. Substrate temperature and oxygen flow rate have important influences on the properties of ITO:Zr films. ITO:Zr films show better crystalline structure and lower surface roughness. Better optical-electrical properties of the films can be achieved at low substrate temperature. The certain oxygen flow rates worsen the electrical properties but can enhance the optical properties of ITO:Zr films. The variation in optical band gap can be explained on the basis of Burstin-Moss effect.
作者 ZHANG Bo XU Xiao-feng DONG Xian-ping WU Jian-sheng
机构地区 Key Laboratory of Ministry of Education for High Temperature Materials and Tests College of Science
出处 《Optoelectronics Letters》 EI 2008年第2期137-139,共3页 光电子快报（英文版）
基金 the Research Fund for Shanghai applied material (0525)
关键词 溅射 ZR 薄膜 结构 溅射 Zr 薄膜 结构
分类号 O484.1 [理学—固体物理]
  • 相关文献

参考文献10

  • 1T. Minami,T.Yamamoto,Y. Toda,and T. Miyata. Thin Solid films . 2000
  • 2C. M. Hsu,J. W. Lee,T. H. Meen,and W. T. Wu. Thin Solid films . 2005
  • 3E. Terzini,P. Thilakan,and C. Minarini. Materials Science and Engineering . 2000
  • 4P. K. Biswas,A. De,N. C. Pramanik,P. K. Chakraborty,K. Ortner,V. Hock,and S. Korder. Materials Letters . 2003
  • 5I. Hamberg,,and C. G. Granqvist. Solar Energy Materials . 1986
  • 6C. Guillen,,and J. Herrero. Vaccum . 2006
  • 7Z. Y. Zhong,,and Y. D. Jiang. Applied Surface Science . 2006
  • 8J. M. Lackner. Thin Solid films . 2006
  • 9S. Aukkaravittayapun,N. Wongtida,T. Kasecwatin,S.Chaojrochkul,K. Unnanon,and P. Chindaudom. Thin Solid films . 2006
  • 10S.Besbes,H. Ben Ouada,J. Davenas,L. Ponsonnet,N. Jaffrezic,and P. Alcouffe. Materials Science and Engineering . 2006

同被引文献16

  • 1王静,王广德,史红,田兆硕,孙玉德.用KMnO_4处理ITO表面制备高效有机电致发光器件[J].光电子．激光,2009,20(3):301-303. 被引量：3
  • 2Song J, Park J S, Kim H, et al. Transparent amorphous indium zinc oxide thin-film transistors fabricated at room temperature [J]. Appl Phys Lett,2007,90(2) :022106.
  • 3Ku D Y, Kim I H, Lee I, et al. Structural and electrical properties of sputtered indium-zinc oxide thin films[J]. Thin Solid Films,2006,515(4) : 1364-1369.
  • 4Liu D S,Sheu C S,Lee C T,et al. Thermal stability of indium tin oxide thin films co-sputtered with zinc oxide [J]. Thin Solid Films,2008,516(10) :3196-3203.
  • 5Minami T, Yamamoto T, Toda Y, et al. Transparent conducting zinc-co-doped ITO films prepared by magnetron sputtering[J]. Thin Solid Films,2000,373(1-2) :189-194.
  • 6Huang C J, Su Y K,Wu S L. The effect of solvent on the etching of ITO electrode[J]. Mater Chem Phys, 2004,84 (1) : 146-150.
  • 7Minami T, Kakumu T,Takata S. Preparation of transparent and conductive In2O3-ZnO films by radio frequency magnetron sputtering[J]. J Vac Sci Technol A, 1996, 14(3) :17004-1708.
  • 8Minami T, Kakumu T, Takeda Y, et al. Highly transparent and conductive ZnO-In2O3 thin films prepared by D. C. magnetron sputtering[J]. Thin Solid Films, 1996,290-291 :1-5.
  • 9Lee C Y,Chang C,Shih W P,et al. Wet etching rates of InGaZnO for the fabrication of transparent thin-film transistors on plastic substrates[J]. Thin Solid Films, 2010,518 ( 14 ) : 3992- 3998.
  • 10Yoo D G,Nama S H,Kim M H,et al. Fabrication of the ZnO thin films using wet-chemical etching processes on application for organic light emitting diode (OLED) devices [J]. Surf Coat Technol, 2008,46 : 1-4.

引证文献1

二级引证文献2

Optoelectronics Letters
2008年 第2期

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部