期刊文献+

Ge纳米结构的制备技术与发光特性研究进展

Progress of the Fabricated Methods and Luminescent Properties of Ge Nanostructures
下载PDF
导出
摘要 Si基纳米发光材料与器件的研究是目前半导体光电子技术领域中的一个活跃前沿.除了Si纳米晶粒、Si量子点和Si/SiO2超晶格等Si纳米结构之外,属于同族元素的Ge纳米结构也因其所具有的优异特性,而呈现出良好的发光性能.评述了Ge纳米结构的制备方法与发光特性在近年内取得的研究进展. Recently, the study of the Si-based luminescent materials and devices has attracted much attention of semiconductor photoelectric technology. Except Si nanostructures, such as Si nanocrystals, Si quantum dots, Si/SiO2 superlattice, Ge nanostructures also exhibit efficient luminescence properties. In the paper, we mainly review the research progress of the fabricated mathods and their luminescent properties of various Ge nanostructures in recent years.
出处 《河北大学学报(自然科学版)》 CAS 北大核心 2008年第1期101-106,共6页 Journal of Hebei University(Natural Science Edition)
关键词 Ge纳米结构 光致发光 电致发光 与氧相关的缺陷 量子限制效应 Ge nanostructure photoluminescence electroluminescence defects relative to oxygen quantum confinement effect
  • 相关文献

参考文献27

  • 1TYSCHENKO I E, TALOCHKIN A B, CHERKOV A G, et al. Optical transitions in Ge nanocrystals formed by high-pressure annealing of Ge^+ ion implanted SiO2 films [J]. Solid State Commun,2004,129:63 - 68.
  • 2RAY S K, DAS K. Luminescence characteristics of Ge nanocrystals embedded in SiO2 matrix [J]. Opt Mater, 2005,27: 948 - 952.
  • 3YE C N, WU X M, TANG N Y,et al. Origin of photolumineseence peaks in Ge-SiO2 thin film [J]. Sci Technol Adv Mater, 2002,3: 257 - 260.
  • 4JIE Y X, WEE A T S, HUAN C H A. Raman and photolumiescence properties of Ge nanocrystals in silicon oxide matrix [J]. Mater Sci Eng B,2004,107: 8- 13.
  • 5ZHANG J Y, BAO X M, YE Y H. Synthesis of Ge nanocrystals in thermal SiO2 film by Ge^+ ion implantation [J]. Thin Solid Films, 1998,323 : 68 - 71.
  • 6SERINCAN U, YERCi S, KULSKCI M, et al. Evolution of SiO2 matrix during the formation of Ge and Si nanocrystals by ion implantation [J]. Nuel Instr and Meth B, 2005,B239:419- 425.
  • 7曾颖秋,卢铁城,沈丽如,李恒,杨经国,邹萍,林理彬.高剂量Ge离子注入直接形成nc-Ge的研究[J].Journal of Semiconductors,2004,25(4):419-423. 被引量:2
  • 8黄昌俊,余金中,王启明.自组装Ge/Si量子点的研究进展[J].自然科学进展,2004,14(1):28-33. 被引量:5
  • 9DASHIELL M W, DENKER U, COSTANTINI G, et al. Photoluminescenee of ultrasmall Ge quantum dots grown by moleeularbeam epitaxy at low temperatures [J]. Appl Phys Lett, 2002, 80(7):1279 - 1281.
  • 10EBERL K, SCHMIDT O G, SCHIEKER S,et al. Formation and optical properties of carbon-induced Ge dots [J]. Solid-State Electron, 1998,42 : 1593 - 1597.

二级参考文献25

  • 1高立刚,陈刚,邓书康,陈亮,阚家德,俞帆,杨宇.磁控溅射Ge薄膜的结晶特性研究[J].功能材料,2004,35(z1):1097-1099. 被引量:3
  • 2岳兰平,姚伟国,戚震中,何怡贞.Ge-SiO_2纳米镶嵌薄膜的制备及光吸收特征[J].科学通报,1995,40(4):378-381. 被引量:2
  • 3王启明.提高Si基材料高效率发光途径的探索[J].物理学进展,1996,16(1):75-88. 被引量:14
  • 4王印月,杨映虎,郭永平,甘润今,何源,薛华,陈光华.埋入SiO_2薄膜中纳米Ge的光学、电学性质和室温可见光致发光[J].物理学报,1997,46(1):203-208. 被引量:11
  • 5黄昌俊 等.自组装生长多层Ge岛的结构分析[A]..第7届全国固体薄膜学术会议,中国电子学会论文集[C].广西北海,2000.166.
  • 6Tang Y S,Electron Lett,1995年,31卷,1385页
  • 7Canham L T. Silicon Quantum Wire Array Fabrication by Electron Chemical and Chemical Dissolution of Wafer [ J ]. Appl. Phys. Lett. , 1990,57 :1046.
  • 8Maeda Y,Tsukamot N, Yazawa Y, et al. Visible Photoluminescence of Ge Mierocrystals Embedded in SiO2 Glassy Matrices [ J ]. Appl. Phys.Lett. ,1991,59:3168.
  • 9Maeda Y. Visible Photoluminescence from Nanocrystallite Ge Embedded in a Glassy SiO2 Matrix: Evidence in Support of the QuantumConfinement Mechanism [ J ]. Phys. Rev. , 1995, BS1 : 1658.
  • 10Kanemitsu Y, Ogawa T,Shiraishi K,Takeda K. Visible Photoluminescenee from Oxidized Si Nanometer-sized Spheres:Exeiton Confinement on a Spherical Shell [ J ]. Phys. Rev. , 1993, 1348:4883.

共引文献13

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部