9Banerjee S, Lin C C, Su S, et al. Cryogenic aerosol cleaning of photomasks [M]//Tanabe H. Photomask and next-generation lithography mask technology XI: 14-16. Yokohama, Japan: International Society for Optical Engineering, 2004, Hiroyoshi Tanabe, editor; sponsored by PMJ-Photomask Japan, BACUS-The International Technical Group of SPIE Dedicated to the Advancement of Photomask, 2005.
10Banerjee S, Campbell A. Principles and mechanisms of sub-micrometer particle removal by CO2 cryogenic technique[J]. Journal of Adhesion Science and Technology, 2005, 19(9): 739-751.
