光刻胶用环化聚异戊二烯的研制

STUDY ON CYCLIZATION OF POLYISOPRENE USED FOR PHOTORESIST

研究了顺１，４聚异戊二烯在二甲苯溶剂中在酸性复合催化剂ＳｎＣｌ４／ＰＴＳＡ存在下的环化反应。发现复合催化剂可在较低的温度下引发聚异戊二烯的环化反应，且可抑制聚合物的降解反应，找到了复合催化剂的最佳组成。制得了适用于光刻胶制造的环化聚异戊二烯。

The cyclization reaction in xylene of cis-1,4-polyisoprene in the presence of binary acidic SnCl 4/PTSA catalyst was studied.It was found that binary catalyst may initiate cyclization reaction of polyisoprene under lower temperature and inhibite the destractive reaction of polyisoprene.The optimum component of binary catalyst was found.The cyclopolyisoprene satisfied for production of photoresist was obtained.