类金刚石膜的结构与性能研究

THE STRUCTURE AND PROPERTIES OF DIAMOND LIKE CARBON FILMS

用激光Ｒａｍａｎ谱和ＸＲＤ谱对用直流射频等离子体化学气相沉积法制备的类金刚石膜的结构进行了分析，并研究了工艺参数对膜的沉积速率、内应力和直流电阻率的影响。结果表明：类金刚石膜是由ｓｐ２和ｓｐ３键组成的非晶态碳膜，当负偏压高于３００Ｖ时，膜中ｓｐ３／ｓｐ２键的比值随负偏压的升高而降低。类金刚石膜的沉积速率与负偏压Ｖｂ成正比。膜内存在１～４．７ＧＰａ的压应力，随负偏压的升高而降低。膜的电阻率随负偏压的升高先增后降，这与膜中ｓｐ２／ｓｐ３的比值相对应。

Diamond like carbon films were deposited from C 2H 2 and Ar plasma in a direct current radio frequency plasma reactor. The films were characterized by X ray diffraction and Raman spectroscopy. Dependence of deposition rate, residual stress and D C electrical resistivity on deposition process were investigated. Diamond like carbon films are amorphous carbon films containing sp 2 and sp 3 bonding. Increasing substrate negative bias, the sp 3/sp 2 ratio decreases gradually, stress decreases linearly and D C electrical resistivity increases at first and then decreases with sp 2/sp 3 ratio rapidly.