摘要
以自制丙烯酰胺-双丙酮丙烯酰胺共聚物和聚乙烯吡咯烷酮(PVP)为成膜基体物质,芳香族叠氮化合物为感光剂,研制出水溶性负性光致抗蚀剂配方.通过正交试验确定了最优配方.即共聚物中AM与DAAM质量比为1∶1;P(AM-DAAM)与PVP质量比为1∶2;感光剂用量为占成膜基体物质质量的1/6;偶联剂用量占成膜基体物质质量的1/60;表面活性剂G-18用量占成膜基体物质质量的1/40.在该配方下配制的光致抗蚀剂达到商品规格要求.通过与国外同类商品的比较得出自制光致抗蚀剂具有同国外商品相当的感光性能.
A formula for preparing the photoresist is developed. The main comlxxsitions of the formula are P（AM-DAAM）, PVP and 4,4＇-diazido-2,2＇-stilbenedisulfonate sodium ,salt （DAS）. The influence on the light sensitivity by components of the formula is studied. According to the orthogonality method, the results are that： the light sensitivity turns out to be best when the ratio of AM/ DAAM of the copolymer by weight is 1： 1, the ratio of P（AM-DAAM）/PVP by weight is 1：2, the amount of DAS is 1/2 to the total amount of P（AM-DAAM） and PVP by weight; the amount of the coupling agent is 1/60 to the total amount of P（AM-DAAM） and PVP by weight; the amount of the surface active agent is 1/40 to the total amount of P（AM-DAAM） and PVP by weight. With this formula, the light sensitivity of the photoresist is 58.4 mJ·cm^-2. And a clear pattern can be obtained. With this formula, the light sensitivity of the photoresist can reach the industry requirements. And the photoresist acts as good as the products from abroad.
出处
《影像科学与光化学》
EI
CAS
CSCD
2008年第2期116-124,共9页
Imaging Science and Photochemistry
