摘要
对微米、亚微米及深亚微米CMOS工艺技术，包括原始硅材料、设计规则、典型器件结构、典型工艺流程和关键工艺技术等，作出全面地概括地分析与研究。
This paper overall analyzes and Studies the Micron, Submicron and Deep-Submicron CMOS process technology, including the raw silicon material,design rule, typical device structure, typical process flow and key process technology etc.
出处
《微处理机》
1997年第1期1-7,共7页
Microprocessors
