期刊文献+

A Comparison of GaN Epilayers with Multiple Buffer Layers and with a Single Buffer Layer Grown on Si(111) Studied by HRXRD and RBS/Channeling

A Comparison of GaN Epilayers with Multiple Buffer Layers and with a Single Buffer Layer Grown on Si(111) Studied by HRXRD and RBS/Channeling
下载PDF
导出
摘要 Two hexagonal GaN epilayers (samples A and B) with multiple buffer layers and single buffer layer are grown on Si (111) by metal-organic vapour phase epitaxy (MOVPE). From the results of Rutherford backscattering (RBS)/channeling and high resolution x-ray diffraction (HRXRD), we obtain the lattice constant (a and c) of two GaN epilayers (aA = 0.3190 nm, cA = 0.5184 nm and aB = 0.3192 nm, CB = 0.5179 nm), the crystal quality of two GaN epilayers ( ХminA=4.87%, ХminB =7.35% along 〈1-↑213〉 axis) and the tetragonal distortion eT of the two samples along depth (sample A is nearly fully relaxed, sample B is not relaxed enough). Comparing the results with the two samples, it is indicated that sample A with multiple buffer layers have better crystal quality than sample B with a single buffer layer, and it is a good way to grow GaN epilayer on Si (111) substrates using multiple buffer layers to improve crystal quality and to reduce lattice mismatch. Two hexagonal GaN epilayers (samples A and B) with multiple buffer layers and single buffer layer are grown on Si (111) by metal-organic vapour phase epitaxy (MOVPE). From the results of Rutherford backscattering (RBS)/channeling and high resolution x-ray diffraction (HRXRD), we obtain the lattice constant (a and c) of two GaN epilayers (aA = 0.3190 nm, cA = 0.5184 nm and aB = 0.3192 nm, CB = 0.5179 nm), the crystal quality of two GaN epilayers ( ХminA=4.87%, ХminB =7.35% along 〈1-↑213〉 axis) and the tetragonal distortion eT of the two samples along depth (sample A is nearly fully relaxed, sample B is not relaxed enough). Comparing the results with the two samples, it is indicated that sample A with multiple buffer layers have better crystal quality than sample B with a single buffer layer, and it is a good way to grow GaN epilayer on Si (111) substrates using multiple buffer layers to improve crystal quality and to reduce lattice mismatch.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2008年第3期1131-1134,共4页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant Nos 10375004 and 10575007, and the Bilateral China-Belgium Cooperation under Grant No BIL04/05. The authors thank Dr K. Cheng for providing the GaN samples.
关键词 CHEMICAL-VAPOR-DEPOSITION X-RAY-DIFFRACTION FILMS CHEMICAL-VAPOR-DEPOSITION X-RAY-DIFFRACTION FILMS
  • 相关文献

参考文献17

  • 1Nakamura S and Fasol G 1997 The Blue Laser Diode-GaN Based Light Emitter and Lasers (Berlin: Springer)
  • 2Ponce F A and Bout D P 1997 Nature 386 351
  • 3Zhou J and Zhang G Y 2002 Chin. Phys. Lett. 19 707
  • 4Nikishin S A et al 1999 Appl. Phys. Lett. 75 2073
  • 5Blasing J et al 2002 Appl. Phys. Lett. 81 2722
  • 6Waldrip K E et al 2001 Appl. Phys. Lett. 78 3205
  • 7Raghavan S and Redwing J M 2004 J. Appl. Phys. 96 2995
  • 8Feng Z C et al 2002 Thin Solid Films 409 15
  • 9Kaganer V M et al 1997 Phys. Rev. B 55 1793
  • 10Qadri S B and Dinan J H 1985 Appl. Phys. Lett. 47 1066

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部