结合烷烃硫醇小分子自组装单层的原子光刻技术--以壬烷硫醇和12烷硫醇为例

Metastable atom lithography with nonanethiol and dodecanethiol self-assembled monolayers as resist

采用不同网格尺寸的透射电镜铜网作为掩模,以烷烃硫醇类小分子自组装单层作为光刻胶,光学质量的云母为衬底,用亚稳氦原子光刻技术制备具有纳米台阶的金膜图形,最终用原子力显微镜分析表征。结果表明:这种技术可将具有纳米台阶的正负图形很好地传递到金膜,具有高的可信度。同时,在不同时的实验中光刻图形的重复性很好。

Using TEM copper grid with different pitch size as physical mask, nonanethiol and dodecanethiol self-assembled monolayers （SAMs） on Au（ 1 1 1） films were patterned by a metastable helium atom beam, and then the patterns with nanoscale edge width were transferred to the underlying gold films by wet chemical etching. Finally, the samples were characterized by atomic force microscope （AFM）. Based on the section analysis of the AFM images, the width of edge was 80 nm - 100 nm and the height of edge was 22 nm - 25 nm. The gold surface as well as the surface of mica substrate were flat, and the rms roughness were 2.0 nm - 4.0 nm and 1.4 nm - 1.6 nm, respectively. On the other hand, it was found that the mask was reproduced as positive or negative patterns with high fidelity, and the repetition of lithographic patterns was well in different runs.