摘要
首次在溴的丙酮溶液中,以钽作阳极,多孔型氧化铝为阴极,通过直流电沉积方法制备Ta/Al2O3复合氧化膜。结果表明:阳极钽在阴极氧化铝的表面和多孔结构内部均有沉积,并以纳米结构与多孔氧化铝结合生成复合氧化膜。
In the bromine acetone solution, the porous aluminum oxide as the cathode substrate and the tantalum piece as the anode, useing the direct current electrodeposition method, the Ta/A12O3 composite oxide film was prepared for the first time. The results show that the tantalum anode dissolves deposit in the porous surface and the porous internal, bonds with the porous oxide film by a nanometer size.
出处
《电子元件与材料》
CAS
CSCD
北大核心
2008年第3期29-31,34,共4页
Electronic Components And Materials
关键词
电子技术
多孔氧化铝
钽
电沉积
复合膜
介电性能
electron technology
porous aluminum oxide
tantalum
electrodeposition
composite film
dielectric properties
