准分子激光光刻技术及进展综述

Review of excimer laser photolithography technique and its progress

从准分子激光的概念及特点引入,概述了以248nm KrF、193nm ArF以及157nm F2准分子激光光刻技术的现状和进展,并探讨了该领域面临的诸多挑战以及解决思路。

By introducing the excimer laser and its features, the current status and the latest progresses of 248 nm KrF, 193 nm ArF and 157 nm F2 excimer laser photolithography techniques are reviewed.And many challenges in these fields and their solutions are also discussed briefly.