硬质合金表面硬质薄膜的制备和性能分析

Preparation of Hard Surface Film on Carbide and Its Performance Analysis

利用热阴极离子镀技术改变主弧电流,控制镀膜时间等参数,在硬质合金基体上制备了TiN薄膜;利用XRD、自动划痕仪、SEM和显微硬度计对所制备的样品进行了结构分析和性能检测。结果表明,生成的膜层是单一的TiN薄膜,所得膜层晶体是细小的柱状晶,膜基结合力最小77N,最大可达98N,显微硬度最高可达HV2757。

In the study, the authors prepare a layer of TiN film on carbide matrix by using hot cathode ion plating techniques. During the preparation, the arc current should be changed and parameters, such as coating time etc., should be- controlled. The structure and performance of the sample are analyzed and tested by X-ray diffraction (XRD), automatic Scratcher, scanning electron microscope (SEM) and microhardness tester. The results gained show that TiN film is a single layer. The Film is small crystal columnar crystal. The membrane-based bonding force is 77 N to 98 N while the microhardness is up to HV2757.