Zn^(2+)/TiO_2薄膜光催化剂的制备及对NO的去除

Preparation of Zn^(2+)/TiO_2 Film Photocatalyst for NO Removal

为研究Zn2+/TiO2薄膜光催化剂对NO的去除效果,以钛酸四正丁酯和Zn(NO3)2为前驱体、石英玻璃片为基片,用在溶胶中进行浸渍提拉的方法,于500℃下煅烧制备出Zn2+加入量不同的Zn2+/TiO2薄膜光催化剂,重点考察了Zn2+加入量对NO去除率的影响。实验结果表明,Zn2+的加入可进一步提高NO的去除率,当Zn2+加入量为4%时,NO最高去除率为89%。对各种试样的扫描电镜和X射线衍射表征结果表明,适当加入Zn2+可改善纳米T iO2的分散状态,减小粒径尺寸,从而达到提高NO去除率的目的。

In order to research the effect of Zn^2＋/TiO2 film photocatalyst on NO removal, Zn^2＋/TiO2 film phtocatalysts with different Zn^2＋ dosage were prepared by dipping-lifting in sol and calcinations at 500 ℃ using Ti （O-Bu）4 and Zn （NO3 ）2 as precursors and quartz glass as substrates. The effect of Zn^2＋ dosage on the NO removal rate was particularly studied. The experimental results indicate that the NO removal rate can be increased with the addition of Zn^2＋. The maximum removal rate of NO is 89% when the dosage of Zn^2＋ is 4%. All samples were characterized by SEM and XRD. The results show that the addition of Zn^2 ＋ can improve the dispersion state of nano-TiO2 particles and reduce their diameters. The purpose of increasing the NO removal rate can be achieved consequently.