Ti-Si-N复合膜的微结构及性能研究

Microstructure and Properties of Ti-Si-N Nano-composites Deposited by Magnetron Sputtering

为研究Si的加入及含量对薄膜结构和性能的影响，采用磁控反应溅射法制备了一系列不同Si含量的n—Si—N复合膜，采用XRD、微力学探针和SEM研究了薄膜的微结构、力学性能和抗氧化性。结果表明：随着Si含量的增加，薄膜晶粒尺寸减小，硬度升高，抗氧化性能提高。Si含量为4％-12％（原子数分数）时，晶粒尺寸随含量增加而急剧下降；当Si含量超过9％时，薄膜硬度处于峰值区；Si含量在7％以上时，薄膜具有较高的抗氧化能力。探讨了n-Si—N复合膜硬度升高和抗氧化能力提高的机理：

A series of Ti-Si-N nano-composite thin films with different silicon content have been deposited by multi-target reactive magnetron sputtering in order to investigate the influence of silicon content on the microstructure and properties of thin films. The microstructure, mechanical properties and high temperature properties were studied with XRD, SEM and nanoindentation. The results show that it leads to grain refinement, hardness enhancement and improvement of high temperature properties as the Si content increases. The grain size decreases sharply as the silicon content increases at a silicon content of around 4% - 12%. The hardness remains at a high level at a Si content of 9% and above. The films show a high oxidation resistance at Si content of 7% and above. The mechanisms of hardness enhancement and improvement of oxidation resistance have been discussed.