多孔硅微结构及其稳定性研究

A Study on Micro Structure of Porous Silicon and Its Stability

应用低温氮吸附法测量了多孔硅（ＰＳ）样品的比表面积、孔容及孔径分布等微结构参数，总结出这些微结构参数随环境条件及工艺参数的变化规律．根据ＰＳ特性的测试结果，进一步论述了处理工艺对其特性的有效影响．为改善和控制多孔硅结构及拓宽应用提出了新方法．

Using nitrogen absorption under low temperature, the micro structure parameters of the porous silicon (PS), such as the specific surface area, pore volume and pore size distribution are obtained, from which the variations of the structure parameters with the ambient conditions and technological parameters are found. After the formation of PS layer, it is treated by boiling and acid corrosion process in order to modify the PS structure. According to the measurement of the properties of PS layer, the positive effects from the process on the properties are discussed. In order to improve the stability of the PS structure, comparatively low current density and higher light intensity are recommended.