期刊文献+

基于量子化霍尔电阻考核的国家电阻基准的稳定性 被引量:2

Stability Research of National Artifact Resistance Standards Based on Quantum Hall Resistance
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摘要 报告了自1990年以来通过与量子化霍尔电阻比对考核的国家直流电阻(实物)基准的长期漂移率及偏差。结果表明2001年以来,国家直流电阻(实物)副基准的漂移率为-0.0551μΩ/a,主基准的漂移率为-0.0808μΩ/a;2006年10月25日,国家直流电阻(实物)基准复现的电阻量值较量子化霍尔电阻的相对偏差为+0.677μΩ/Ω,预计2007年1月1日需要修正-0.69μΩ/Ω。 The drifts and deviations of National DC (artifact) Resistance Standards by comparison with Quantum Hall Resis- tance(QHR) since 1990 is reported. The results indicate that the Secondary (artifact) Resistance Standards has been drifting in - 0.0551 μΩ/a since 2001, and the Primary (artifact) Resistance Standards in - 0.0808μΩ/a. Moreover, the resistance based on the Primary (artifact) Resistance Standards deviated + 0.677 μΩ/Ω of that on QHR on October 25, 2006, and - 0.69μΩ/Ω is expected to correct on January 1, 2007.
出处 《计量学报》 EI CSCD 北大核心 2007年第2期97-101,共5页 Acta Metrologica Sinica
关键词 计量学 电阻基准 漂移率 量子化霍尔电阻 气压系数 ,. Metrology Resistance standard Drift Quantum Hall resistance (QHR) Atmospheric pressure coefficient (APC)
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参考文献10

  • 1崔广英.1990年中国电压、电阻单位改值工作手册-我国电阻基准及其单位量值[Z].北京:国家质量技术监督局,1989,123-139.
  • 2Delahaye F,Bournaud D,Witt T.Report on the 1990 international comparison of 1 Ω and 10 kΩ resistance standards at the BIPM[J].Metrologia,1992,29:273-283.
  • 3Nakanishi M,Kinoshita J,Endo T,et al.Comparison of resistance standards between the National Institute of Metrology (China) and Electrotechnical Laboratory(Japan)[J].Metrologia,2002,39(2):207 - 212.
  • 4张钟华,贺青.低温电流比较仪介绍[J].电测与仪表,2000,37(4):9-11. 被引量:3
  • 5Zhang Z H,He Q.A Precise CCC bridge for QHR standard at NIM[A].CPEM2002[C],Ottawa:2004,282 - 283.
  • 6李正坤,贺青,张钟华,刘勇.提高低温电流比较仪测量准确度的几方面措施[J].计量学报,2004,25(4):289-293. 被引量:5
  • 7张钟华,贺青,李正坤,刘勇.量子化霍尔电阻国家标准的研究[J].计量学报,2005,26(2):97-101. 被引量:14
  • 8Li Z K,Han B.The portable enclosure with high temperature homogeneity and stability[A].CPEM2004[C],London:2004,180 - 181.
  • 9Shao H M.The uncertainty evaluation of automatic direct current comparator bridge[A].CPEM2002[C],Ottawa:2002,58 - 59.
  • 10Shao H M,Lin F P,Liang B,et al.The atmospheric pressure dependence of standard resistors and its decrescence[A].CPEM2006[C],Torino:2006,502-503.

二级参考文献34

  • 1von Klitzing K, Dorda G, Pepper M. New method for high -accuracy determination of the fine - structure constant based on Quantized Hall Resistance[J]. Phys Rev Lett, 1980, 45:494 - 497.
  • 2Tsui D C, Gossard A C. Resistance standard using quantization of the Hall resistance of GaAs - Alx Ga1-x As hetrostructures[J]. Appl Phys Lett, 1981, 38:550 - 552.
  • 3Laughlin R B. Quantized Hall conductivity in two dimensions[J]. Phys Rev, 1981, B 23: 5632 - 5633.
  • 4Zhang Zhonghua. Hall- effect in the two- dimensional specimen with cross - section of arbitrary shape and its possible applications[J]. 计量学报. 1983, 4(4): 241 -249.
  • 5Williams J M, Kleinschmidt P. A cryogenic current comparator bridge for resistance measurements at currents of up to 100A[J]. IEEE Trans on IM, 1999, 48:375 - 378.
  • 6Sese J, et al. Design and Realization of an Optimal Current Sensitive CCC[J]. IEEE Trans on IM , 1999,48:370 -374.
  • 7Early M D, van Dam M A. Results from a detailed calculation of the sensitivity of a cryogenic current comparator[J]. IEEE Trans on IM, 1999, 48: 379- 382.
  • 8Nakanishi M, et al. Comparison of resistance standards between the National Institute of Metrology (China) and the Electrotechnical Laboratory (Japan) [ J]. Metrologia, 2002,39: 207 - 212.
  • 9Delahaye F, et al. Report from the working group on the Quantum Hall Effect[A]. Report of the 18th Meeting of CCE[C]. BIPM. 1988.
  • 10Delahaye F. Technical guidelines for reliable measurements of quantized Hall Resistace[J]. Metrologia, 1989, 26:63 -68.

共引文献18

同被引文献4

  • 1张钟华,贺青,李正坤,刘勇.量子化霍尔电阻国家标准的研究[J].计量学报,2005,26(2):97-101. 被引量:14
  • 2崔广英.1990年中国电压、电阻单位改值工作手册:我国电阻基准及其单位量值[Z].北京:国家质量技术监督局,1989,123-139.
  • 3Delahaye F, Bournaud D. Witt T. Report on the 1990 International Comparison of 1 Ω and 10 kΩ Resistance Standards at the BIPM[J]. Metrologia, 1992, 29:273 - 283.
  • 4aNakanishi M, Kinoshita J, Endo T, et al. Comparison of resistance standards between the National Institute of Metrology (China) and Electrotechnical Labotrory ( Japan )[J]. Metrologia, 2002, 39(2): 207 - 212.

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