摘要
对合成的三种三芳基硫六氟锑酸盐(Ph3S+SbF-6,,MePhPh2S+SbF-6,t-BuPhPh2S+SbF-6)用红外光谱、核磁共振谱和元素分析进行了表征,并研究了以此作光引发剂的环氧聚甲基硅氧烷EPS和双酚A环氧E44的阳离子光固化。结果表明光引发剂结构、浓度及蒽、酚噻嗪等光敏剂对光固化速度有不同程度的影响,并得到固化速度快、机械性能较好、具有明显“后固化”特征的光固化组成物。
Three triarylsulfonium hexafluoroantimonates microstructures were characterized by IR、H-NMR and elemental analysis. Study of the mechanism of cationic photocuring of epoxy resin-epoxypolysiloxane (EPS) and biphenol A epoxide (E-44) with these sulfonium salts was conducted, the influence of concentration and structure of photoinitiator and added photosensitizers on photocuring rate were also studied. The results show that these sulfonium salts have high photoreactivity and excellent storage stability, and the films of EPS/E-44 using those sulfonium salts as photoinitiator have good techenical properties. The photocurable compositions of EPS/E-44 can be desired to utilize extensively in manufacturing new type of UV- cured coating, adhesives and sealing materials.
出处
《功能高分子学报》
CAS
CSCD
1997年第3期393-398,共6页
Journal of Functional Polymers
关键词
三芳基硫Wong
六氟锑酸盐
环氧树脂
光引发剂
Triarylsulfonium hexafluoroantimonates, Epoxy resin, Cationic photocuring, Photoinitiator