摘要
By using the closed orbit theory, the photodetachment cross section of H- in a static electric field between two parallel elastic interfaces is derived and calculated. It is found that the photodetachment cross section depends on the electric field and the distance between the ion and the elastic interface. The oscillation of the cross section becomes more complicated than in the case of H- near one elastic interface. The results show that near the detachment threshold, the influence of the additional interface can be neglected. But with the increase of the energy, its influence becomes great. At some energies, the cross sections display sharp peaks, contrasting with the staircase structure when only one interface exists. This study provides a new understanding of the photodetachment process of H- in the presence of external field and interfaces.
By using the closed orbit theory, the photodetachment cross section of H- in a static electric field between two parallel elastic interfaces is derived and calculated. It is found that the photodetachment cross section depends on the electric field and the distance between the ion and the elastic interface. The oscillation of the cross section becomes more complicated than in the case of H- near one elastic interface. The results show that near the detachment threshold, the influence of the additional interface can be neglected. But with the increase of the energy, its influence becomes great. At some energies, the cross sections display sharp peaks, contrasting with the staircase structure when only one interface exists. This study provides a new understanding of the photodetachment process of H- in the presence of external field and interfaces.
基金
Project supported by the National Natural Science Foundation of China (Grant No 10604045)
