ICP-AES法测定RhCl3中微量杂质元素

Determination of Impurities in RhCl_3 by ICP-AES

用等效浓度差减法扣除Rh基体对杂质元素测定的干扰，用ICP-AES测定了RhCl3化合物中13个杂质元素含量。方法操作简便、快速，避免了直流电弧发射光谱分析方法烦琐的操作步骤并节约了大量的Rh基体，在精密度和准确度上也优于直流电弧发射光谱法。方法检测范围：Pb、Sn为0．003％～0．3％；Mg、Cu为0．0005％～0．05％；Fe、Ni、Cr、Zn、Al为0．001％～0．1％；Pt、Pd、Si为0．002％～0．2％。除Sn外的12个杂质元素的加标回收率为92．7％～117．3％，方法精密度为1．0％～8．5％。

The ICP- AES method for the determination of 13 impurity elements in RhCl3 was developed . RhCl3 sample was desolved in 10% HCl solution. The effect of rhodium matrix on the determination of the impurity elements was corrected by equivalent matrix concentration calibration method. The determination ranges of the method are as follows： 0. 0005% ～ 0. 05% for Mg, Cu; 0. 001% ～ 0. 1% for Fe, Ni, Cr, Zn, Al; 0.002% ～0.2% for Pt, Pd, Si; 0.003% ～0.3% for Pb and Sn. The recoveries and RSD are 92.7% ～ 117.3% and 1.0% ～8.5% , respectively.