期刊文献+

GaN发光二极管表观电阻极值分析 被引量:2

Analysis of Apparent Resistance Extremum in GaN LED
下载PDF
导出
摘要 利用正向交流(ac)小信号方法对GaN发光二极管的电容-电压特性进行测量,可以观察到GaN发光二极管中的负电容现象。利用LED串联等效电路对表观电容和表观电阻进行了测量,表观电阻-正向电压曲线出现了一个极值点。通过对相关文献分析,提出负电容现象的根本原因是在较高的正偏下微分电容dQ/dU<0;推论出pn结的微分电容先随正向偏压的增大而急剧增大,当出现复合发光后随正向偏压的增大而减小,直到随正向偏压的增大而出现负值;正向偏置电压较大时,结电导电流的变化率根据I-V特性曲线取极大值,此时微分电容由于强复合效应已快速变小,表观电阻有极大值;得到了表观电阻极大值表达式。表观电阻与正向电压曲线的极值点与理论模型相吻合,证明了该理论模型的正确性。 The forward current-voltage characteristic and forward capacitance-voltage characteristic measurings are the most important methods to study the forward electricity characteristic of GaN light-emitting diodes. We can use the forward alternating current (ac) small signal method to measure the capacitance-voltage characteristic of the GaN light-emitting diodes. Some value of GaN light-emitting diodes parameters can be deduced from capacitance-voltage characteristic. The negative capacitance phenomenon of GaN light-emitting diode can be observed by using this method. Measuring the apparent capacitance and resistance by the serial equivalent circuit of LED for measurement, there is an extremum point in apparent resistor-voltage curve. Propose that the basic reason of negative capacitance is that the differential capacitance less than zero by analyzing relation literature. Infering that the differential capacitance of pn junction will grow by leaps and bounds follow the voltage of forward bias grows ; the differential capacitance of pn junction will lower till less than zero when the forward bias voltage is higher than the threshold voltage of light-emitting diodes begin emitting light., The current change rate of junction conductor will be max base on current-voltage curve when the forward bias voltage is higher than the threshold voltage of light-emitting diodes begin emitting light, and then the differential capacitance of pn junction fall down quickly for radiative-recombination, so apparent resistor is maximum. We obtain the expression of max apparent resistor. We analyze the extreme point of apparent resistor-voltage curve. The result of theory analysis agree with the experiment. That proved the accuracy of this theory model. The research on apparent resistance phenomenon will be valuable for study the electrical characteristics of GaN light-emitting diodes, and will be valuable for the knowledge improvement of the characteristic and parameter relevant the pn junction internal structure of GaN light-emitting diodes. The study of apparent resistance may open research for novel devices and applications.
出处 《发光学报》 EI CAS CSCD 北大核心 2008年第2期337-341,共5页 Chinese Journal of Luminescence
关键词 GAN发光二极管 表现电阻 正向交流(ac)小信号方法 Ⅰ-Ⅴ特性曲线 GaN light-emitting diode apparent resistance forward alternating current (ac) small signalmethod current-voltage curve
  • 相关文献

参考文献8

二级参考文献30

  • 1陈永,冯列峰,朱传云,王存达.发光二极管中负电容的测试及判定[J].河北工业大学学报,2005,34(4):24-27. 被引量:3
  • 2王军,冯列峰,朱传云,丛红侠,陈永,王存达.发光二极管中负电容现象的实验研究[J].光电子.激光,2006,17(1):1-4. 被引量:7
  • 3冯列峰,朱传云,陈永,曾志斌,王存达.发光二极管中负电容现象的机理[J].光电子.激光,2006,17(1):5-8. 被引量:7
  • 4[1]MENG Ji-wu,WANG Yan-xin,WANG Jing,et al.Study of white TESs by light conversion[J].J.of Optoelectronics*Laser(光电子*激光),2003,14(6):566-569.(in Chinese)
  • 5[2]V Aubry,F Meyer.Schottky diodes with high series resistance:limitations of forward I-V methods[J].J.Appl.Phys.,1994,76(12):7973-7984.
  • 6[3]T Noguchi,M Kitagawa,I Tuniguchio.Negative capaci-tance of silicon diode with deep level traps[J].Jpn.J.Appl.Phys.,1980,19(7):1423-1425.
  • 7[4]C H Champmess,W R Clark.Anomalous inductive effect in selenium schottky diodes[J].Appl.Phys.Lett.,1990,56(12):1104-1106.
  • 8[5]M Ershov,H C Liu,L Li,et al.Unusual capacitance behavior of quantum well infrared photodetectors[J].Appl.Phys.Lett.,1997,70(14):1828-1830.
  • 9[6]M Ershov,H C Liu,L Li,et al.Negative capacitance effect in semiconductor devices[J].IEEE Trans.Electron.Devices,1998,45(10):2196-2206.
  • 10[8]A G U Perera,W Z Shen,M E Shov.Negative capacitance of GaAs homojunction far-infrared detectors[J].Appl.Phys.Lett.,1999,74(21):3167-3169.

共引文献14

同被引文献21

  • 1莫春兰,方文卿,刘和初,周毛兴,江风益.硅衬底InGaN多量子阱材料生长及LED研制[J].高技术通讯,2005,15(5):58-61. 被引量:9
  • 2Nakamura S. The roles of structure imperfections in InGaN-based blue light-emitting diodes and laser diodes [ J ]. Science, 1998, 281(5379) :956-961.
  • 3Chert X L, Cao Y G, Lan Y C. Synthesis and structure of nanocrystal-assembled bulk GaN [ J ]. J. Crystal Growth, 2000, 209( 1 ) :208-212.
  • 4Takao Someya, Ralph Werner, Alfred Forchel. Room temperature lasing at blue wavelengths in GaN [ J]. Science, 1999, 285 ( 5435 ) : 1905-1906.
  • 5Ng H M, Doppalapudi D, Moustakas. The role of dislocation scattering in r-type GaN films [ J ]. Appl. Phys. Lett. , 1998, 73(6) :821-823.
  • 6Tomoya Sugahara, Hisao Sato, Maosheng Hao. Direct evidence that dislocations are non-radiative recombination centers in GaN [J]. Jpn. J. Appl. Phys., 1998, 37(4A) :398-400.
  • 7Miller E J, Schaadt D M, Yu E T. Reduction of reverse-bias leakage current in Schottky diodes on GaN grown by MBE using surface modification with an AFM [J]. J. Appl. Phys. , 2002, 91(12) :9821-9826.
  • 8Yoshiki Kato, Shota Kitamura, Kazumatsu Hiramatsu. Selective growth of wurtize GaN and A1GaN on GaN/sapphire by MVPE [J]. J. Crystal Growth, 1994, 144(3-4):133-140.
  • 9Feng G, Zheng X I-I, Fu Y. Investigation on the origin of crystallographic tilt in lateral epitaxial overgrown GaN using selective etching [ J ]. J. Crystal Growth, 2002, 243 ( 1 ) :94-102.
  • 10PengDongsheng FengYuchun LiuWen.Effect of surface treatment for sapphire on GaN optical properties .光子学报,2007,8(36):4440-4444.

引证文献2

二级引证文献12

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部