摘要
150K的低温下，NO在清洁的Ru表面的吸附，HeⅡ-ARUPS显示在Ef以下9．3eV（5σ＋1π）和14．6eV（4σ）处有两个峰，表明NO在Ru表面上是分子吸附。NO－4σ峰强度随HeⅡ光入射角的变化说明NO分子是倾斜地吸附在Ru表面上，其倾斜趋向于原于间距较大的〈0001〉力位。对于NO在Cs／Ru表面的吸附，ARUPS测得在Ef以下6．2，9．2，11．1，12．4和14．9eV处有五个峰，与N2O气侧的UPS谱比较，认定它们是N2O，NO共存的结果，表明NO在CS／Ru表面上分解后可形成N2O分子的吸附。
Nitric oxide adsorption on Ru and Cs/Ru have been investigated using He ⅡARUPS at 150 K. The angle -resolved UPS of NO/Ru show that NO is a molecular adsorption on the Ru surface,and the weaker dependence of NO-4σ intensity on incident angle suggests that the orientation of the adsorbed NO tilts in (0001) azimuth. The results of UPS of NO adsorbed on Cs/Ru surfaces,with low Cs-coverage,show that NO is partially dissociated to form N2O molecules.
出处
《真空科学与技术》
CSCD
北大核心
1997年第5期293-298,共6页
Vacuum Science and Technology
基金
国家自然科学基金
关键词
氧化氮吸附
表面吸附
AURPS
倾斜吸附
Nitric oxide adsorption,Surface adsorption,Angle resolve ultraviolet photoelectron spectra, Tilt adsoption
