非平衡磁控溅射TiC_xN_(1-x)薄膜微结构及性能分析

Micro-Structure and Mechanical Properties of TiC_xN_(1-x) Films Deposited by Unbalanced Magnetron Sputtering

为了研究不同沉积条件下TiCxN1-x(0≤x≤1)薄膜的相结构、显微硬度及摩擦性能的影响因素,用扫描电子显微镜(SEM)、X射线衍射仪分析薄膜的形貌和相结构,用HXD-1000数字式显微硬度计、MCMS-1摩擦磨损仪测试薄膜的硬度和摩擦系数.研究结果表明:TiN,TiC薄膜显示出〈111〉择优取向生长趋势,Ti(C,N)有较强的〈200〉取向,Ti(C,N)衍射峰涵盖了TiN峰和TiC峰,薄膜存在TiN和TiC两相共存.与TiN,TiC相比,Ti(C,N)薄膜具有更高硬度,当C原子含量x=0.582时,Ti(C,N)薄膜硬度达到最大值为33.6 GPa,且表现出更低的摩擦系数和更好的耐磨性能.

In order to researche the influence factor of the microstructure, micro-hardness, friction properties of the TiCxN1-x （0≤x≤1） thin films with various deposition condition, the microstructure and morphology of the film were studied by XRD and SEM, and the friction properties and micro- hardness of the thin films were tested by HXD-1000 and MCMS-1. The research showed that the titanium nitride and titanium carbide thin films were more liable to choose 〈111〉; Ti（C, N） thin films are more liable to choose （200）. Ti（C,N） thin films＇ diffraction apex contained the TiN and TiC thin films＇ diffraction apex,and the thin film had TiN and TiC two phases. Ti（C,N） thin films had higher degree of hardness compared with TiN and TiC thin films. When the carbon atom content x=0. 582, the Ti（C, N） thin film reached maximium hardness of 33. 6 GPa, and achieved much lower friction coefficients and better friction performance.