摘要
针对磁控溅射Au金属薄膜,从实验角度研究了该薄膜电阻率与表面粗糙度、残余应力的关系,并对结果进行了分析。结果表明:薄膜电阻率随着表面粗糙度及残余应力的增加而增大。分析认为,晶体取向可能在金属薄膜力学性能和功能性之间有某种联系,并从应变能角度给予了解释。该结果为进一步探讨薄膜力学性能和功能特性的内在关系提供了研究基础。
Au film was fabricated on Al2O3 substrate by magnetron sputtering. The relationship between resistivity of metallic film and its surface roughness, residual stress was investigated according to experimental results. The results show that the resistivity of the metallic film correlates with surface roughness and residual stress. The increase of resistivity with surface roughness and tensile residual stress can be explained by the strain energy theory. It can be inferred that crystal orientation may be connect with the mechanical behavior and functional property of metallic film.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2008年第4期617-620,共4页
Rare Metal Materials and Engineering
基金
国家自然科学基金(50601005)
关键词
金属薄膜
电阻率
表面粗糙度
残余应力
metallic film
resistivity
surface roughness
residual stress