磁控溅射镍膜及其性能的研究

Performance of Nickel Films Deposited on PET by Magnetron Sputtering

采用磁控溅射法在聚对苯二甲酸乙二醇酯(PET)基材上制备了镍薄膜。用扫描电子显微镜(SEM)分析溅射功率、溅射真空室气压等工艺参数对镍薄膜表面形貌的影响;研究了溅射工艺参数与薄膜性能之间的关系。实验结果表明,在室温下,随着溅射气压的增加,沉积速率和粒径都是先增加后又逐渐变小,而薄膜的电阻则随着压强的增大先减小后逐步增大;薄膜的表面粗糙度随着溅射功率的增加而增大;膜层与基材的剥离强度较大且均匀,膜层结合较为牢固,薄膜的耐摩擦性能较为优良。

Ni thin film is prepared on PET spun-bonded nonwoven fabric by magnetron sputtering at room temperature. The effect of technical parameters, such as sputtering power, vacuum pressure, on the morphology and particle diameters of the Ni thin film was analyzed by SEM. The relation between sputtering parameters and the performance of the Ni thin film was also investigated. The experimental results show that sputtering velocity and the particle size increase at the beginning and then decrease as the pressure increases. The change of thin film resistance was the opposite of that sputtering velocity. The surface roughness increases along with the increase of sputtering power. The binding strength between films and substrate was researched by peeling test and friction test; the results indicate that peeling strength is large and uniform which confirms that the film and substrate are firm cohesive. The fastness to abrasion of the films is good.