摘要
采用射频反应磁控溅射法在硬质合金衬底上沉积了CN_x薄膜和CN_x/TiN复合薄膜。薄膜的结构和元素成分用傅里叶变换红外光谱(FTIR)和X射线光电子能谱(XPS)测试。红外吸收光谱说明薄膜中碳、氮原子结合成的化学键有C-N,C=N和C≡N,另外还存在少量的N-H和C-H键;X射线光电子能谱分析证明沉积中间层TiN的样品结合能位移增大,其中氮碳原子成键多,从而提高了样品的耐磨性能。
The CNx films and CNxTiN multi-layers were deposited onto cemented carbide substrates by RF magnetron sputtering. The structure and elemental composition of the films were analyzed by Fourier transform infrared （FTIR） spectroscopy and X-ray photoelectron spectroscopy （XPS）. FTIR revealed the existence of the C-N, C=N, C≡N, C-H and N-H bonds in the films. XPS showed an increased binding energy shift in the TiN interface layer. The TiN interface layer improved the wear resistance of the CNx films.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2008年第A01期477-480,共4页
Rare Metal Materials and Engineering
关键词
CNX薄膜
硬质合金
X光电子能谱
摩擦性能
CNx thin films
cemented carbide
X-ray photoelectron spectroscopy
tribological properties
