摘要
采用溶胶-凝胶旋涂工艺在普通玻璃基片上制备出Al-F共掺杂ZnO薄膜,共掺杂离子浓度从0.25%增加到1.25%,退火气氛分别为空气、氢气和氩气,退火温度均为450℃。利用XRD和SEM测试方法研究了共掺杂离子浓度和退火气氛对薄膜的结晶状态与表面形貌的影响;此外,用紫外-可见分光光度计及四探针法等仪器对其透光性以及电阻率进行了测试,进一步研究了退火气氛对薄膜光电性能的影响。结果表明:制备的Al-F共掺杂ZnO薄膜多数表面平整,晶粒致密均匀,随着掺加浓度的增加,晶粒呈现出沿(002)晶面择优生长并且晶粒尺寸逐渐变大(由17.3nm增加到51.4 nm)。各种气氛下制备的薄膜在可见光大部分范围内透过率均超过80%;通过比较不同气氛下各种薄膜的电阻率,可以看到在H2气氛中退火处理后其电阻率最低为9.36×10-2Ω.cm;此外,与单一掺杂Al离子或F离子的薄膜相比较,Al-F共掺ZnO薄膜电阻率最低。
From using sol-gel revolving daub process on regular glass ribbon to product Al-F intermingle ZnO film, intermingle hydronium consistence added from 0.25 % to 1.25 %, annealing atmospheres are air, hydrogen and argon, annealing temperature is 450 degree. By using XRD and SEM testing method to research the effect of intermingle hydronium consistence and annealing atmosphere on film crystallization and surface appearance; moreover, using ultraviolet-visible light photometer and four probe method etc. Instruments to test its transparent and resistance rate, also research the effect of annealing atmosphere on film photo-electricity performance.
出处
《国外建材科技》
2008年第2期56-63,共8页
Science and Technology of Overseas Building Materials
