摘要
采用多弧离子镀制备了多彩Al/TiNO(掺氮TiO2)薄膜,利用SEM观察了薄膜的表面、断面形貌,并测量了其膜厚。采用XRD研究了薄膜的相结构。利用紫外-可见分光光度计研究了TiNO膜的可见光谱特性,用红外比辐射率测量仪测量了样品的红外发射率。结果表明:在不改变Al箔在8—14μm波段低红外发射率的情况下,实现了其物理着色。所得薄膜为锐钛矿型TiO2结构,薄膜表面平整、致密,结合力较好。Ti—NO薄膜呈明显柱状生长,薄膜试样表面未出现明显缺陷,薄膜表面致密,柱状颗粒生长完好。TiNO薄膜的沉积速率达120nm/min。
The surface of Al/TiNO ( Nitrogen doping TiO2 ) film was prepared by Multi-arc plasma deposition technique. The surface morphology, the section morphology and the thickness of the films were observed by scanning electron microscopy (SEM). The structure of the film was analysed by X - ray diffraction (XRD). The visible spectrum was studied by use of UV-visible spectrophotometer. The samples' infrared emissivity was measured by the infrared emissivity measuring instrument. The results showed that:under the condition of unchanged infraved emissivity of Al foil in the band of 8 - 14 μm physical coloring of the film was obtained. The film has anatase TiO2 structure. The surface of the film is plane, dense and with a good bonding. TiNO film showed columnar growth, noapparent shortcomings on the surface of the sample film, dense membrane surface, and intact cylindrical particle growth. The measurement of the film thickness shows TiNO films' deposition rate is 120 nm/min.
出处
《宇航材料工艺》
CAS
CSCD
北大核心
2008年第2期26-29,共4页
Aerospace Materials & Technology
基金
国家自然科学基金(50471004)
关键词
低红外发射率
多弧离子镀
二氧化钛
氮掺杂
光学性能
Low infrared emissivity, Multi-Arc ion plating, TiO2, Nitrogen doping, Optical performance